Ion Beam Surface Analysis and Nanoscale Patterning leaf node


URI

https://openalex.org/T12166

Label

Ion Beam Surface Analysis and Nanoscale Patterning

Description

This cluster of papers focuses on the use of ion beam techniques, such as Secondary Ion Mass Spectrometry (SIMS) and swift heavy ions, for surface analysis, nanoscale patterning, and molecular imaging. It covers a wide range of applications including surface engineering, nanostructure fabrication, and depth profiling of biological samples.

Implementation

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    rdfs:label "Ion Beam Surface Analysis and Nanoscale Patterning"@en ;
    rdfs:isDefinedBy openalex: ;
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    skos:broader oasubfields:2206 ;
    skos:definition "This cluster of papers focuses on the use of ion beam techniques, such as Secondary Ion Mass Spectrometry (SIMS) and swift heavy ions, for surface analysis, nanoscale patterning, and molecular imaging. It covers a wide range of applications including surface engineering, nanostructure fabrication, and depth profiling of biological samples."@en ;
    skos:inScheme openalex: ;
    skos:prefLabel "Ion Beam Surface Analysis and Nanoscale Patterning"@en ;
    openalex:cited_by_count 960296 ;
    openalex:works_count 69577 .