https://openalex.org/T11338
This cluster of papers focuses on electron beam lithography, nanofabrication, and resolution limits in lithography techniques. It explores the applications of extreme ultraviolet lithography, chemically amplified resists, and high-resolution patterning materials. The cluster also discusses the challenges related to line edge roughness and mask design in nanolithography.
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openalex:cited_by_count 266359 ;
openalex:works_count 45561 .