Plasma Physics and Technology in Semiconductor Industry leaf node


URI

https://openalex.org/T10781

Label

Plasma Physics and Technology in Semiconductor Industry

Description

This cluster of papers covers a wide range of topics related to plasma physics and its applications in the semiconductor industry, including plasma etching techniques, atomic layer etching, Hall thrusters for spacecraft propulsion, electron energy distribution function measurements, and ion-molecule collisions. It also explores the use of plasmas in electric propulsion for satellites and spacecraft.

Implementation

@prefix oasubfields: <https://openalex.org/subfields/> .
@prefix openalex: <https://lambdamusic.github.io/openalex-hacks/ontology/> .
@prefix owl: <http://www.w3.org/2002/07/owl#> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix xsd: <http://www.w3.org/2001/XMLSchema#> .

<https://openalex.org/T10781> a skos:Concept ;
    rdfs:label "Plasma Physics and Technology in Semiconductor Industry"@en ;
    rdfs:isDefinedBy openalex: ;
    owl:sameAs <https://en.wikipedia.org/wiki/Plasma_physics>,
        <https://openalex.org/T10781> ;
    skos:broader oasubfields:2208 ;
    skos:definition "This cluster of papers covers a wide range of topics related to plasma physics and its applications in the semiconductor industry, including plasma etching techniques, atomic layer etching, Hall thrusters for spacecraft propulsion, electron energy distribution function measurements, and ion-molecule collisions. It also explores the use of plasmas in electric propulsion for satellites and spacecraft."@en ;
    skos:inScheme openalex: ;
    skos:prefLabel "Plasma Physics and Technology in Semiconductor Industry"@en ;
    openalex:cited_by_count 810170 ;
    openalex:works_count 97908 .